Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

Rapid Thermal Annealing AET

Rapid thermal annealing equipment   /   AET

Contacts :   LAFOSSE   Xavier  

  • Space
    AET
  • Space
    RTA AET Oven

Caractéristiques

  • Max temperature   :   up to 1000°C (30" max.)
  • Gas Line   :   ArH2, N2
  • Type of substrate holder   :   Graphite susceptor (w/ Lid)
  • Max sample size   :   2 inches
  • Vacuum   :   Primary Pumping available
Applications

Ohmic contacts annealing

This RTA is mostly used for annealing ohmic contacts.

Contacts : xavier.lafosse@c2n.upsaclay.fr