ICP-RIE SENTECH SI500
Chlorine, Bromine ICP-RIE plasma.
ICP-RIE SENTECH SI500
Chlorine, Bromine ICP-RIE plasma.
ICP-RIE SENTECH SI500S
Chlorine, Bromine plasma ; R&D.
STS Multiplex ICP
Chlorine, Fluorine plasma
ICP-DRIE SPTS
Fluorine plasma. Deep Reactive Ion Etching
ICP Sentech SI500
Fluorine plasma
CCP-RIE NEXTRAL (1)
Fluorine and oxigen CCP-RIE plasma
CCP-RIE NEXTRAL (2)
Fluorine and oxigen CCP-RIE plasma.
CCP-RIE ADVANCE VACCUM
Fluorine plasma
IBE Roth & Rau Ionsys 500 (1)
Ion Beam Etcher
IBE Roth & Rau Ionsys 500 (2)
Ion Beam Etcher
Xactix – XeF2
XeF2 ( xenon di-fluoride) reactor
NANOPLAS
High Density Radical Flux reactor
DIENER Nano
Low-pressure plasma at 13.56 MHz
DIENER Pico
Low-pressure plasma at 40KHz
CCP-RIE NEXTRAL 56
CCP-RIE Chlorine or CH4-O2 etching