Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

Cluster Vinci sputtering system

Ultra High Vacuum confocal sputtering cluster   /   Vinci/Méca 2000

Contacts :   MARTIN   Antoine     /   ULYSSE   Christian

  • Space
    Cluster Vinci sputtering system UHV
  • Space
    Cluster Vinci

Caractéristiques

  • Available Metals   :   Si, Al, Nb
  • Power   :   1x RF 5kW, 3x DC 1kW
  • Type of substrate holder   :   rotating substrate holder
  • Gas Line   :   Ar, N2, O2
  • Limit vacuum   :   8 10-9 mbar
  • Sample Size   :   max 6 inch
  • Vacuum   :   3 turbo molecular pumping
Expertises

Bolometer arrays fabrication

The main purpose of this co-sputtering cluster, is the deposition of different superconducting alloys (NbN, NbSi, AlSi...), with variable compositions and thus variable Critical temperatures. NbSi is used as a superconductor layer for the fabrication of large bolometer arrays.

  • Space
  • Space
  • Space

Contacts : benoit.belier@c2n.upsaclay.fr, antoine.martin@c2n.upsaclay.fr