SEM Philips XL 40 LaB 6

Large-Chamber LaB6 Scanning Electron Microscope with Integrated Micro-Manipulators   /   FEI

Contacts :   COURAUD   Laurent     /   DUPUIS   Christophe

Location : RD123a

Scanning Electron Microscope with LaB6 é emitter, Very Large Chamber and housing for micro-manipulators (Kleindiek MM3A)

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    Philips XL40 LaB6
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    Overview of the system

Caractéristiques

  • Electron gun   :   LaB6 crystal emitter
  • Objective lens   :   HR (field free)
  • Voltage   :   1kV - 30kV
  • Spot size   :   1 to 8
  • Magnification   :   x30 to x300000
  • Stage   :   3 axis motorized stage, manual Z and Tilt -30° to 60°
  • Eucentric height   :   10 mm
  • Resolution   :   3 nm @30kV
  • Max sample size   :   12 inches
  • Detectors   :   SE (ETD)
  • Stage   :   Travel ranges: X,Y +/-75mm Z 37mm
Expertises

Micro-manipulations

Micro-manipulations (membrane deflection, tensile tests ...)

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Contacts : Fabien BAYLE, Laurent COURAUD

Etching profiles

Observation of the etching profiles and roughness of micro-(periodic) structures after lithography, etching and photoresist removal steps

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Contacts : Fabien BAYLE