Wet Etching and Chemistry

 

A short description of the ressource

 

E93_S04_Chem3_Nanomaterials_Spin

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E1403_S03_Acid_Wet_Etching

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E1403_S02_Acid_HF_Cleaning

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Acid-base wetbenches for wet etching

Wetbenches for wet etching of III.V, Si, dielectric materials

E1403_S01_Solvant_Cleaning

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HF vapor wet etching

The idonus hydrofluoric HF vapor enables stiction-free release by thermally-controlled etching of the silicon dioxide layer.