E93_S04_Chem3_Nanomaterials_Spin

Short Description

Acid-base wetbenches for wet etching

Wetbenches for wet etching of III.V, Si, dielectric materials

E1403_S02_Acid_HF_Cleaning

Short Description

E1403_S03_Acid_Wet_Etching

Short Description

E1403_S01_Solvant_Cleaning

Short Description

HF vapor wet etching

The idonus hydrofluoric HF vapor enables stiction-free release by thermally-controlled etching of the silicon dioxide layer.