Evap Plassys MEB 400 UHV SL

Electron beam evaporator for metallic thin films   /   PLASSYS

Contacts :   COURAUD   Laurent     /   DURNEZ   Alan

Location : E 51

The MEB 400 UHV-SL is an ultra-vacuum evaporation equipment load lock with: - heating lamp (250°C max) - UV lamp (ozone generator for the elimination of organic contaminants) - oxidation capability (Josephson contact) - vacuum limit at 10-8mbar Chamber with : - electron gun with 6 possible materials (Ti, Au, Ni, Ge, Pt) - chamber vacuum limit at 2.10-9mbar - a 4-inch diameter substrate holder with planetary rotation and tilt with possible programming, heating of the substrate holder up to 700°C - a KDC75 ion cannon - liquid nitrogen cooling above the turret to limit heating induced by evaporation

  • Space
    Load Lock holder
  • Space
    Load Lock UV cleaner
  • Space
    general view of the equipment

Caractéristiques

  • Working pressure   :   <2.10e-9 mbar
  • Limit vacuum   :   <9.10e-10 mbar
  • Max sample size   :   4''
  • Electron gun   :   6 crucibles
  • Gas Line   :   Ar, O2
  • Number of Quartz   :   4
  • Crucible size   :   15 cc
  • Ion gun   :   75 mm
  • Temperature   :   700°c
  • Tilt   :   tilt with possible programming
  • Available Metals   :   Au, Ni, Ge, Ti, Pt