Centre for Nanoscience
and Nanotechnology

  • CNRS

PIMENT Platform

Nanoimprint Nanonex NX 2500

Nanoimprint lithography (NIL) tool   /   NANONEX

Contacts :   DECANINI-CRETON   Dominique  

- press for UV and Thermal imprint - uniform pressure applied by membranes

  • Space
    Nanonex
  • Space
    Nanonex press
  • Space
    Nanonex
  • Space
    uniform pressure applied by membranes

Caractéristiques

  • Max sample size   :   4 inches
  • Max temperature   :   200°C
  • Min sample size   :   small piece
  • Temperature range   :   room temperature to 200°C
  • Type of cooling   :   water cooling (skid2)
  • Light source   :   320 nm - 390 nm
Applications

biosensing at the sub-attomolar level

Fabrication of a large surface graphene nanomesh by nanoimprint lithography (NIL) to produce controlled artificial edges. Such a nanomesh platform allows direct detection at the sub-attomolar level with more than 90% of molecules located on the imprinted artificial edges. DOI: 10.1039/c6nr04289a

  • Space
  • Space
  • Space

Contacts : anne-marie.haghiri@c2n.upsaclay.fr