Tubular furnaces Vegatec
2 oxidation furnaces / 2 tubular ovens / VEGATEC
Contacts : MAILLARD François
/ LAFOSSE Xavier
Location : N.C.
A1-Silicon wet oxidation
A2-Silicon dry oxidation
B1-Thermal annealing for dielectric materials
B2-Thermal annealing for other materials
Caractéristiques
- Deposit : Oxidation
- Gas Line : A1 : N2, O2, Cl4 | A2 : N2, H2, O2, Cl4 | B1 : N2, Ar | B2 : N2, Ar, Ar-H, O2
- Max sample size : 4"
- Max temperature : 1200°C
- Nature of the sample : Si only for oxidation (A1-A2) - Dielectric materials annealing (B1) - Other materials annealing(B2)
- Working pressure : atm
