Centre for Nanoscience
and Nanotechnology

  • CNRS

PIMENT Platform

IAD Plassys MEB 800

Ion Assisted electron beam Deposition / In-situ ellipsometry   /   PLASSYS

Contacts :   LAFOSSE   Xavier     /   MAILLARD   François

Location : N.C.

This machine is equipped with an ellipsometer allowing a real-time monitoring of optical thicknesses during growth (real time fitting procedure)

  • Space
    IAD Plassys MEB 800
  • Space
    IAD Plassys MEB 800

Caractéristiques

  • Electron gun   :   8 x 15cc crucibles - 7kW
  • Ion source   :   End Hall source (Ar, N2)
  • Materials   :   SiO2, Ti3O5, HfO2, Al2O3, MgF2, YF3...
  • Ellipsometer type   :   Spectroscopic or multi-channel, in-situ, real-time
  • Wave length   :   200nm-2000nm
Expertises

Interferential filters growth

This equipment allows the growth of multi-dielectric layer stacks for optical applications: DBR, Anti-Reflective coatings, Aperiodic filters.

  • Space

Contacts : xavier.lafosse@c2n.upsaclay.fr

Coatings on various geometries

It is possible to deposit filters on various geometries: Laser ridge facet, Optical fiber, 5 cm long waveguide, very thin mica substrate (2µm)

  • Space

Contacts : xavier.lafosse@c2n.upsaclay.fr; francois.maillard@c2n.upsaclay.fr

Real-time ellipsometric monitoring

The use of an in-situ ellipsometer (spectroscopic or 32-λ simultaneous detection) allows the acquisition of spectras during process and the fit of the curves obtained to extract refractive index and deposited thickness, all in real time.

  • Space

Contacts : xavier.lafosse@c2n.upsaclay.fr; francois.maillard@c2n.upsaclay.fr