Centre for Nanoscienceand Nanotechnology
Contacts : LAFOSSE Xavier
/ MAILLARD François
This machine is equipped with an ellipsometer allowing a real-time monitoring of optical thicknesses during growth (real time fitting procedure)
This equipment allows the growth of multi-dielectric layer stacks for optical applications: DBR, Anti-Reflective coatings, Aperiodic filters.
Contacts : firstname.lastname@example.org
It is possible to deposit filters on various geometries: Laser ridge facet, Optical fiber, 5 cm long waveguide, very thin mica substrate (2µm)
Contacts : email@example.com; firstname.lastname@example.org
The use of an in-situ ellipsometer (spectroscopic or 32-λ simultaneous detection) allows the acquisition of spectras during process and the fit of the curves obtained to extract refractive index and deposited thickness, all in real time.