Centre for Nanoscience
and Nanotechnology

  • CNRS

PIMENT Platform

PECVD UNAXIS D200

Plasma Enhanced Chemical Vapor Deposition   /   OC OERLIKON

Contacts :   DURNEZ   Alan     /   MAILLARD   François

This PECVD reactor is used for the deposition of common materials such as Silicon oxide or nitride and amorphous silicon. It can be used as well to deposit periodic multi-layers (DBR). No optical monitoring.

  • Space
    PECVD UNAXIS D200
  • Space
    ND200-1
  • Space
    ND200-2
  • Space
    ND200
  • Space
    ND200-3

Caractéristiques

  • Materials   :   SiO2, Si3N4, a:Si-H
  • Temperature   :   150 °C -280°C
  • Max sample size   :   4 mm height
  • Max sample size   :   8 inches
Applications

Isolation

Silicon oxide or silicon nitride are deposited for basic isolation coatings.

Contacts : alan.durnez@c2n.upsaclay.fr

Amourphous silicon depositions

The deposition of amorphous silicon (a:Si) is possible on this equipment.

Contacts : alan.durnez@c2n.upsaclay.fr

DBR Coating /ARC coating

The deposition of basic optical filters is possible: Periodic Quarter Wavelength Optical Thicknesses (QWOT) SiO2/SiN (DBR) or single layer Anti reflective coating (ARC).

Contacts : alan.durnez@c2n.upsaclay.fr