ICP-RIE SENTECH SI 500S

Inductive Coupled Plasma - Reactive Ion Etching chlorine, bromine plasma / SENTECH INSTRUMENTS GMBH

Contacts : FERLAZZO Laurence / LAOURINE Feriel

Location : E81

The SI 500 S ICP is a developpment etching process tool. Different plasma diagnostic tool are available. Multi chambers configuration offer a large potential of Chlorine and Bromine etching processes ; for example III-V compound semiconductors (GaAs, InP, GaN, InSb) but also other materials like inox, GeSn, ..

ICP-RIE SENTECH SI500S
ICP-RIE Sentech ICP2

Caractéristiques

Mask : Electro-and photo-sensible resist, SiO2, Si3N4
Gas Line : BCl3, Cl2, HBr, CH4, H2, Ar, N2 , O2, SF6
Wafer Holder : 4” / Chuck : mechanical
Wafers thermalization : 20°C à 190°C ; He-backside contact
End point detector : Laser interferometry 670 nm
HF generators power ICP : 2000 Watts
HF generators power platen : 600 Watts
Option : Multi chambers configuration to avoid cross contamination
Option : OES, mass spectrometry, electronic and ion probes for plasma diagnostics