Fluorine and oxigen CCP-RIE plasma. / Nextral (Plasma-Therm)
Contacts : FERLAZZO Laurence
The main applications of this fluorine and oxigen Capacitively Coupled Plasma- Reactive Ion Etching (CCP-RIE) equipment are silicon etching, dielectric etching mask fabrication ( Si3N4, SiO2), thin resist etching or descum.