CCP-RIE NEXTRAL 56
Capacitively Coupled Plasma - Reactive Ion Etching chlorine or CH4-O2 etching / PLASMA-THERM
Contacts : FERLAZZO Laurence
/ LAOURINE Feriel
Location : E84
CCP-RIE Chlorine or CH4-O2 etching
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CCP-RIE NEXTRAL 56
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CCP-RIE Chlorine Nextral