Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

CCP-RIE NEXTRAL 56

CCP-RIE Chlorine or CH4-O2 etching   /   Plasma-Therm/Corial/ Nextral

Contacts :   FERLAZZO   Laurence     /   CERCUS   Jean-Luc

CCP-RIE Chlorine or CH4-O2 etching

  • Space
    CCP-RIE NEXTRAL 56
  • Space
    CCP-RIE Chlorine Nextral