NANOPLAS

Resist stripping Descum Isotropic fluorine etching Surface oxidation Hydrophilic-phobic traitment   /   NANOPLAS

Contacts :   CERCUS   Jean-Luc  

Resist stripping Descum Isotropic fluorine etching Surface oxidation Hydrophilic-phobic traitment

  • Space
    Nanoplas

Caractéristiques

  • Temperature range   :   50 à 170°C
Expertises

SiO2 bridge

SiO2 bridge 200nm thick

  • Space

Contacts : jean-luc.cercus@c2n.upsaclay.fr