Contacts : FERLAZZO Laurence
HDRF® (High Density Radical Flux reactor) is plasma without high level energy ion and photon exposure, in opposition with conventional plasma source. It provides a damage free processing, allowing cleaning of high aspect ratio structures, preventing collapsing or stiction free of membranes, and activation of ultra-sensitive materials. The Nanoplas-developed HDRF photoresist stripping capability is also applicable to Bosch polymer removal after DRIE processing.
Caractéristiques
