Aligner EVG 620
Double-side mask aligner system / EVG
Contacts : BOUVILLE David
Location : SB021-E332
Mask aligner double side
lamp Hg lengwave 365 nm
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Caractéristiques
- Wave length : 365 nm
- Resolution : 1 µm
- Power : 5.84 mW/cm2
- Mode : Proximity, Hard, Vacuum, VH contact, Soft
- Substrates : Pieces of sample until 6 inches