CCP-RIE Apsy STS

Capacitively Coupled Plasma - Reactive Ion Etching fluorine plasma / SPTS TECHNOLOGIES

Contacts : EDMOND Samson

Location : E1404

you can use this ccp-rie sts for etching silicon , silica, silicon nitride for several hundred nanometers.

Caractéristiques

Expertises

Contacts : samson

Contacts : samson