CCP-RIE STS

CCP-RIE etching of silica, silicon nitride, silicon   /   STS

Contacts :   EDMOND   Samson     /   ISAC   Nathalie

you can use this ccp-rie sts for etching silicon , silica, silicon nitride for several hundred nanometers.

  • Space
    STS Reactive Ion Etch

Caractéristiques

  • Gas Line   :   SF6,02
  • Power   :   0-600W
  • Pressure   :   0-100 mt
Expertises

silicon

silicon

  • Space

Contacts : samson

silica

silica

  • Space

Contacts : samson