CCP-RIE Apsy STS
Capacitively Coupled Plasma - Reactive Ion Etching fluorine plasma / SPTS TECHNOLOGIES
Contacts : EDMOND Samson
Location : E1404
you can use this ccp-rie sts for etching silicon , silica, silicon nitride for several hundred nanometers.
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CCP-RIE STS
Caractéristiques
- Gas Line : SF6,02
- Power : 0-600W
- Pressure : 0-100 mt