Contacts : MAILLARD François
Location : SB030–E82
In Ion Beam Milling (IBM) an inert ion beam is used for pure physical sputtering of the sample material. This technique is commonly used for structuring metals or other materials which are not accessible to chemical etch pro-cesses. Reactive Ion Beam Etching (RIBE) uses reactive process gases to generate a reactive ion beam. Physical and chemical etch components and related selectivities may be easily varied by the energy of the ion beam. Ion beam etching might serve applications difficult to be addressed by common etch technologies.
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