XeF2 Xactix

Vapor phase isotropic silicon etch for structure release   /   XACTIX

Contacts :   EDMOND   Samson     /   HERTH   Etienne

This tool is meant to isotropically etch silicon using a gas phase. The gas is produced by a solid source of XeF2. XeF2 vapor phase etching exhibits nearly infinite selectivity of silicon to photo-resist, silicon dioxide, silicon nitride and aluminum.

  • Space
    Vapor phase isotropic silicon etch for structure release
  • Space
    Vapor phase isotropic silicon etch for Nitride structure release
Applications

etching XeF2

cantilevers

  • Space

Contacts : samson