Contacts : AASSIME Abdelhanin / FERLAZZO Laurence
Location : E84
This Low Pressure Plasma Systems at 40 kHz give highest ion density (compare at 13.56 MHz and 2,45GHz). This Cleaner though it may sound the weakest, a low frequency can make the biggest difference in quality. This will easily increase the efficiency and improve the uniformity of the particles. Although it might be the slowest to etch materials, it will be the best in quality. (used for cleaning, activation, etching of organic or inorganic materials)
Caractéristiques
