DIENER Pico

Low-pressure plasma at 40KHz   /   Diener electronic GmbH

Contacts :   LE ROUX   Xavier     /   CERCUS   Jean-Luc

This Low Pressure Plasma Systems at 40 kHz give highest ion density (compare at 13.56 MHz and 2,45GHz). This Cleaner though it may sound the weakest, a low frequency can make the biggest difference in quality. This will easily increase the efficiency and improve the uniformity of the particles. Although it might be the slowest to etch materials, it will be the best in quality. (used for cleaning, activation, etching of organic or inorganic materials)

  • Space
    DIENER Pico
  • Space
    Low Pressure Plasma System _ Diener Pico

Caractéristiques

  • Gas Line   :   O2, Ar
  • Wafer Holder   :   4” plate
  • HF generators power ICP   :   200 Watts at 40 kHz
  • Etch materials   :   Resists , all polymers