Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

DIENER Nano

Low-pressure plasma at 13.56 MHz   /   Diener electronic GmbH

Contacts :   LE ROUX   Xavier     /   CERCUS   Jean-Luc

Low Pressure Plasma Systems offer solutions for any type of contamination ; for a wide range of options for surface modification (cleaning, activation, etching of organic or inorganic materials). Here the frequency 13.56 MHz, one of the standard frequencies used world wide for industrial, scientific, and medical is used for a faster etching process.

  • Space
    DIENER Nano
  • Space
    Low Pressure Plasma System _ Diener Nano

Caractéristiques

  • Gas Line   :   O2, CF4
  • Wafer Holder   :   6” plate
  • HF generators power ICP   :   300 Watts at 13,56 MHz
  • Etch materials   :   Resists , all polymers