MEB Verios G4 HP

XHR Scanning Electron Microscope / ThermoFisher Scientific

Contacts : DUPUIS Christophe / MAHUT Frederic

XHR Scanning Electron Microscope. SE (ETD, TLD), BSE (MD, ICD, DBS), STEM detectors.

Verios
Colonne
Vue générale

Caractéristiques

Detectors : SE (ETD, TLD), BSE (MD, ICD, retractable DBS), STEM
Max sample size : 4 inches wafers, 5 inches photomask
Resolution : 0.7nm @ 2kV
Stage : 5 axis compucentric piezo stage, deceleration
Electron gun : FEG Schottky (+"UniColor" monochromator)
Objective lens : Field Free (Search mode), Immersion
Voltage : 50V - 30kV
Current : 0.7 pA to 100 nA
Resolution : STEM mode: 1nm@30kV
Others : Anticontaminator (cold trap), plasma cleaner
Others : Autoloader
Others : Column Elstar (no mechanical alignment)
Magnification : x30 to 2000000x (Polaroïd)

Expertises

Low kV imaging of nanostructures on insulators

Nanoparticles on insulators, nanocrystals

Contacts : Fabien BAYLE

Observation of photoresists

Low dose é imaging of spin-coated Photoresist layers (top view, cross-sections) and 3D lithography grown micro-structures (polymer)

Contacts : Fabien BAYLE, Christophe DUPUIS

Mask observation

Observation of lithography mask patterns (on thick insulator)

Contacts : Fabien BAYLE, Christophe DUPUIS

Applications

Epitaxial growths

Morphology of nanowires grown by epitaxy (shape, size)

Contacts : Fabien BAYLE

Morphology and rugosity of processed materials

Observe Morphology and rugosity of processed materials (deposition, lithography, etching). Put in evidence the presence of Residual contaminations. Applied to Photonic waveguides, Quantum Physics circuits ...

Contacts : Fabien BAYLE

Nanoparticles

Dispersed nanoparticles on substrate (spin coating, dip-coating...). Applied to sensors and emitter sources.

Contacts : Fabien BAYLE

Nano-devices

Nano-devices and patterns formed by local deposition (Focused Ion Beam)

Contacts : Fabien BAYLE