Sputter Astemec

RF / DC cathodic sputtering for metallic thin films   /   LEYBOLD

Contacts :   MAILLARD   François     /   BAPTISTE   Téo

Location : E1404

The Astemec sputtering is an equipment allowing the deposition of thin metallic layers of W on substrates from cm2 to 3".

  • Space
    Astemec

Caractéristiques

  • Power   :   50 - 100 W
  • Materials   :   Tungsten
  • Max sample size   :   3 inches
  • Max sample size   :   1 mm height
Applications

Education

Equipment mainly used for student training

Contacts : teo.baptiste@c2n.upsaclay.fr