Sputter Astemec
RF / DC cathodic sputtering for metallic thin films / LEYBOLD
Contacts : MAILLARD François
/ BAPTISTE Téo
Location : E1404
The Astemec sputtering is an equipment allowing the deposition of thin metallic layers of W on substrates from cm2 to 3".
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Caractéristiques
- Power : 50 - 100 W
- Materials : Tungsten
- Max sample size : 3 inches
- Max sample size : 1 mm height