Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

Astemec Sputtering

Sputtering for metallic thin films   /   Leybold

Contacts :   BAPTISTE   Teo  

The Astemec sputtering is an equipment allowing the deposition of thin metallic layers of W on substrates from cm2 to 3".

  • Space
    Astemec

Caractéristiques

  • Power   :   100 W
  • Materials   :   Tungsten
  • Max sample size   :   3 inches
  • Max sample size   :   1 mm height
Applications

Education

Equipment mainly used for student training

Contacts : teo.baptiste@c2n.upsaclay.fr