Co-Sputter Alliance Concept 450

RF / DC cathodic co-sputtering equipment / ALLIANCE CONCEPT

Contacts : CONNETABLE Lucie / DURNEZ Alan

Location : E42

RF/DC Co-sputtering depositions. Metallic thin films and some reactive sputtering depositions.

Alcatel AC450
co pulvérisation cathodique AC 450

Caractéristiques

Available Metals : Ti, Al, Au, V, Pt...
Power : 1 x RF 600W (Targets)
Power : 1 x RF 300W (Bias Mode, substrate holder)
Power : 2 x 2kW DC (Targets)
Max temperature : up to 500°C
Gas Line : Ar, N2, O2, Xe
Type of substrate holder : Rotating substrate holder
Vacuum : Turbo molecular Pumping

Expertises

TiO2 phase anatase

Development of a recipe for obtaining a thin layer of titanium oxide in the anatase crystallographic phase. The purpose of this study was to create micro batteries implanted in cardiac pacemakers.

Contacts : Antoine MARTIN