Centre for Nanoscience
and Nanotechnology

  • CNRS
  • UPSaclay
  • UParis

PIMENT Platform

Electron beam evaporator Plassys MEB550SL

Electron beam evaporator metallic thin films   /   Plassys

Contacts :   LEROY   Laetitia     /   COURAUD   Laurent

The MEB 550SL is an electron beam evaporation equipment allowing the deposition of thin metallic layers.

  • Space
    Electron beam evaporator Plassys MEB550SL
  • Space
    MEB 550SL
  • Space
    Evaporation Au

Caractéristiques

  • Available Metals   :   Al, Ag, Au, Ni, Ge, Ti, Cr
  • Working pressure   :   < 2e-7 mbar
  • Limit vacuum   :   2,5e-8mbar
  • Max sample size   :   6"
  • Electron gun   :   8 crucibles
  • Crucible size   :   15cc
  • Ion cannon   :   10cm
  • Gas Line   :   Ar, O2
  • Number of Quartz   :   2
  • Angle of incidence   :   -90° to 90°
Applications

contact

Ohmic contact on GaAs, InP, n and p type

Contacts : Laetitia Leroy, Laurent Couraud

contact

Schottky contact (Ti/Au)

Contacts : Laetitia Leroy, Laurent Couraud

Mask

Cr mask

Contacts : Laetitia Leroy, Laurent Couraud

Mask

semiconductor dry etching mask

Contacts : Laetitia Leroy, Laurent Couraud

Mask

Thin layer of Ge for large form factor etching mask

Contacts : Laetitia Leroy, Laurent Couraud

Shadow mask evaporation

Realization of Single-atom electron pump by double-angle evaporation of aluminum through a suspended PMMA shadow.

  • Space

Contacts : christian.ulysse@c2n.upsaclay.fr