Evap Plassys MEB 400

Electron beam evaporator for metallic thin films / PLASSYS

Contacts : LEROY Laetitia / DURNEZ Alan

The MEB 400 is an electron gun evaporation equipment allowing the deposition of metal films ranging from a few tens of nanometers to several micrometers

Electron Beam Evaporator MEB 400
MEB 400

Caractéristiques

Available Metals : Ti, Au, Ni, Cu
Allowed metals : Ti,Au,Cu,Ni,Cr
Working pressure : < 2e-7 mbar
Limit vacuum : 2e-8mbar
Max sample size : 4"
Electron gun : 4 crucibles 15cc
Crucible size : 15cc
Number of Quartz : 1

Applications

Thick deposits

Thick deposits up to 3 micrometers thick Cu film> 1micrometer

Contacts : Laetitia Leroy, Alan Durnez

Ni

Ni magnetic layer

Contacts : Laetitia Leroy, Alan Durnez

deposits

engraving mask

Contacts : Laetitia Leroy, Alan Durnez