Electron Beam Evaporator MEB 400

Electron beam evaporator metallic thin films   /   Plassys

Contacts :   LEROY   Laetitia     /   DURNEZ   Alan

The MEB 400 is an electron gun evaporation equipment allowing the deposition of metal films ranging from a few tens of nanometers to several micrometers

  • Space
    MEB 400

Caractéristiques

  • Available Metals   :   Ti, Au, Ni, Cu
  • Allowed metals   :   Ti,Au,Cu,Ni,Cr
  • Working pressure   :   < 2e-7 mbar
  • Limit vacuum   :   2e-8mbar
  • Max sample size   :   4"
  • Electron gun   :   4 crucibles 15cc
  • Crucible size   :   15cc
  • Number of Quartz   :   1
Applications

Thick deposits

Thick deposits up to 3 micrometers thick Cu film> 1micrometer

Contacts : Laetitia Leroy, Alan Durnez

Ni

Ni magnetic layer

Contacts : Laetitia Leroy, Alan Durnez

deposits

engraving mask

Contacts : Laetitia Leroy, Alan Durnez