SEM Hitachi S3600N

Large Variable Pressure (low vac/high vac) Scanning Electron Microscope Tungsten filament / HITACHI

Contacts : MAHUT Frédéric / COURAUD Laurent

Location : SB005f-E14

Variable Pressure (low vacuum/high vacuum) Scanning Electron Microscope with Hair pin Tungsten filament and very large chamber. SE, BSE (retractable), ESED/AE (low vac), EDX detectors.

S3600N
Vue générale

Caractéristiques

Detectors : SE, retractable BSE, ESED/AE preamplifier (low vac), EDX-nitrogen cooled Si(Li) 10mm^2
Pressure : From 1 to 300 Pa with "Low Vacuum" mode
Stage : 5 axis motorized compucentric stage
Resolution : 3nm @ 25kV WD=5mm
Resolution : 4.5 nm @ 25kV 1Pa (BSE mode)
Electron gun : Hairpin tungsten filament
Others : Column: 2-stage condenser
Voltage : 1kV - 30kV (low HV emission bias)
Magnification : x20 to x300000
Max sample size : 10 inches
Objective lens : HR (field free)

Expertises

Observation and EDX analysis of thin films and micro-devices

é imaging (topography, roughness) and elemental analysis (region of interest, line profile, mapping) of thin films and micro-devices realized by clean room processes (vacuum deposition, optical lithography, etching)

Contacts : Fabien BAYLE

Micro-analysis layers reconstruction

EDX Micro-analysis of thin layer stacks using dedicated Stratagem software to reconstruct {material, thickness} stacks of multi-layered vacuum deposits.

Contacts : Fabien BAYLE

Applications

MEMS (Microelectromechanical systems)

3D overview of the micro-devices using Tilt

Contacts : Fabien BAYLE