MAGELLAN_400L

XHR Scanning Electron Microscope.   /   Philips/FEI

Contacts :   DUPUIS   Christophe     /   BAYLE   Fabien

eXtra High Resolution Scanning Electron Microscope. Equipped with a STEM detector, an EDS INCA system and a vCD detector (for BSED at low voltage).

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    Colonne
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    Système de clampage du Porte échantillon
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    Platine Piezo et colonne 68°
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    Vue générale

Caractéristiques

  • Resolution   :   0.9 nm @ 1kV
  • Max sample size   :   4 inches wafers, 5 inches photomask
  • Stage   :   5 axis compucentric piezo stage, deceleration
  • Detectors   :   SE (ETD, TLD), BSE (vCD), EDS X-Max (50mm^2), STEM
  • Electron gun   :   FEG Schottky (+"UniColor" monochromator)
  • Objective lens   :   Field Free (Search mode), Immersion
  • Voltage   :   200V - 30kV
  • Current   :   1.6 pA to 50 nA
  • Resolution   :   STEM mode: 1nm@30kV
  • Magnification   :   x30 to 1000000x (polaroïd ?)
  • Others   :   Anticontaminator (cold trap), plasma cleaner
  • Others   :   Autoloader
  • Others   :   Column Elstar (no mechanical alignment)
Expertises

EDX analyzes

EDX analyzes (ponctuals, by regions of interest and mapping)

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Contacts : Fabien BAYLE

XHR observation on tin beads

Reference sample for automatic calibration of the microscope with tin beads. Search (field free) & Immersion +UC Modes

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Contacts : Christophe DUPUIS, Fabien BAYLE

Observation of photoresists

Low dose é imaging of spin-coated Photoresist layers and 3D lithography grown micro-structures (polymer)

Contacts : Christophe DUPUIS, Fabien BAYLE

Mask observation

Observation of lithography mask patterns (on thick insulator)

Contacts : Christophe DUPUIS, Fabien BAYLE

Observation of nanostructures with SE, STEM

Nanowires (incl. stacking faults), Quantum dots, Nanorods, Nanofoams ...

Contacts : Christophe DUPUIS, Fabien BAYLE

Applications

Piezo eucentric stage

View of the stage movements inside the microscope. This piezo turntable allows precise and rapid movements over a wide range of distance.

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Contacts : Fabien BAYLE