MEB_HITACHI_S4800

Cold FEG Scanning Electron Microscope   /   HITACHI

Contacts :   DUPUIS   Christophe     /   BAYLE   Fabien   /   MAHUT   Frederic

Cold FEG Scanning Electron Microscope. LM (Low Mag) and UHR (Ultra High Resolution) modes. SE BSE detectors

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    Overview of the system
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    Vue générale
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    Porte substrat petits échantillons tilt à 45°
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    Pige de vérification de la hauteur
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    Hitachi S4800

Caractéristiques

  • Max acceleration voltage   :   30kV
  • Detectors   :   SE (Lower, Upper), BSE (Upper)
  • Stage   :   3 axes motorized stage, deceleration
  • Electron gun   :   W cold FEG emitter
  • Magnification   :   x30 to x800000
  • Max sample size   :   4 inches
  • Others   :   Anticontaminator (cold trap)
  • Others   :   Loadlock
  • Others   :   Column with 2-condenser
Expertises

Observation of nanostructures with SE, BSE

Observation of nanowires, quantum wells, patterns after electron beam lithography…

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Contacts : Christophe DUPUIS, Fabien BAYLE

Periodicity measurements

pitch calculation of a grating

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Contacts : Christophe DUPUIS, Fabien BAYLE

Observation of photoresists

Low dose é imaging of spin-coated Photoresist layers and 3D lithography grown micro-structures (polymer)

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Contacts : Christophe DUPUIS, Fabien BAYLE

Applications

Observation of nanostructures with SE

Observation of nanowires, quantum wells, patterns after electron beam lithography...

  • Space

Contacts : Christophe DUPUIS, Fabien BAYLE