Centre for Nanoscience
and Nanotechnology
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en
Centrale de Technologie
PIMENT Platform
Menu
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PIMENT Platform
The C2N Micro-Nano-Technology Facility
Virtual Visit
Staff-Resources
Lithography
E-Beam Lithography
Optic/UV Lithography
Alternative and Emerging Lithography
Deposition
Metal deposition and electrolytic growth
Dielectric deposition and thermal treatments
Etching
Dry Etching
Wet Etching and Chemistry
Analysis / Back-end
Electron and near-field microscopy
Back-End
Electrical and physico-chemical characterizations
Members
profilométre Tencor IQ
mechanical profilometer /
Tencor
Contacts : DURNEZ Alan
tencor IQ
Caractéristiques
Displacement table : Max. Length sweep: 10 mm from left to right and 2 mm from right to left
Sweep time : Scanning speed: from 2 to 200 µm / s
Max sample size : 4 pouces
Max sample size : 17,5 mm
Support force : 1 à 100 mg
