Centre for Nanoscience
and Nanotechnology

  • CNRS

PIMENT Platform

EBL Raith EBPG 5200

100kV Electron Beam Lithography system   /   RAITH B.V. - RAITH NANOFABRICATION

Contacts :   COUDEVYLLE   Jean-rene     /   CAMBRIL   Edmond

In September 2019 the electron beam writer Raith EBPG5200 has been installed at C2N in a dedicated cleanroom of class 10 (ISO 4) with high precision temperature control at 21 ± 0.1° C. This stability in temperature is a prerequisite for the minimization of thermal drift in the electron optics, and thus, for the excellent performance of the system. The EBPG5200 is a high performance nanolithography system used to pattern large areas by high-resolution electron beam lithography. It is a vector-scan direct write tool with a Gaussian shaped beam which operate up to 100 keV acceleration voltage with an exposure 125 MHz pattern generator. This instrument has substrate holders to handle samples of 10x10 mm² up to 200 mm wafers.

  • Space
    EBPG_5200
  • Space
    EBPG 5200 C2N

Caractéristiques

  • Emitter   :   Field effect gun
  • Energy   :   100 keV
  • Frequency   :   125 MHz
  • Current   :   50pA to 300nA
  • Resolution   :   sub 10 nm
  • Positioning accuracy   :   0.15 nm
  • Writing field   :   160x160µm² to 1040x1040µm²
  • Substrates   :   1 cm square to 8 inches wafer
  • Thickness   :   up to 10 mm thick samples
  • Spot size   :   2 nm at 5nA
  • Option   :   writing along Z-axis
Expertises

Tailoring ebeam lithography

Using GenIsys BEAMER software, we can simulate and correct the proximity effect to realize a Fresnel lens in PMMA.

  • Space
  • Space
  • Space
  • Space

Contacts : Edmond Cambril, edmond.cambril@c2n.upsaclay.fr

Sub-wavelength engineering of silicon

Periodic structuration with feature sizes as small as 50 nm and total lengths reaching tens of millimetres.

  • Space
  • Space
  • Space

Contacts : Carlos Ramos, carlos.ramos@universite-paris-saclay.fr; Xavier Le Roux, xavier.leroux@universite-paris-saclay.fr.

Greyscale lithography

We have develop greyscale lithography using both Genisys software BEAMER and the Raith EBPG5200 ebeam mask aligner. This lithography allows us to address different height in resist versus its x,y position. Some applications would be lens, stairs or 3D volume

  • Space
  • Space
  • Space
  • Space
  • Space
  • Space
  • Space

Contacts : Jean-René Coudevylle, Edmond Cambril

Meta Lens in TiO2

Using Genisys BEAMER software, we have simulated and adapt the dose during an e-beam exposure to realize meta surface in a thick e-beam resist (600nm). The Mold is then used to grow a TiO2 thin film via ALD.

  • Space
  • Space
  • Space
  • Space

Contacts : Edmond Cambril, Guissepe Leo