In September 2019 the electron beam writer Raith EBPG5200 has been installed at C2N in a dedicated cleanroom of class 10 (ISO 4) with high precision temperature control at 21 ± 0.1° C. This stability in temperature is a prerequisite for the minimization of thermal drift in the electron optics, and thus, for the excellent performance of the system.
The EBPG5200 is a high performance nanolithography system used to pattern large areas by high-resolution electron beam lithography. It is a vector-scan direct write tool with a Gaussian shaped beam which operate up to 100 keV acceleration voltage with an exposure 125 MHz pattern generator. This instrument has substrate holders to handle samples of 10x10 mm² up to 200 mm wafers.
