Orion NanoFab Zeiss

Helium Ion Microscope   /   ZEISS

Contacts :   ULYSSE   Christian  

High resolution ion column for Helium and Neon ions. Equipped with Oxford OMNIGISII gas injection system for ion beam induced deposition, FIBICS pattern generator and two IMINA robots with tips for in situ electrical measurements or manipulations

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    Pc control desk
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    column NanoFab
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    N2 filling system

Caractéristiques

  • Voltage   :   from 15kV to 30kV
  • Minimum spot size   :   0.5nm@30kV and 0.5pA with He gas
  • Sample Size   :   2 inches
  • Stage   :   5 axis compucentric piezo stage
  • Tilt   :   50°
  • Option   :   Low voltage electron beam neutralizer
  • Option   :   Plasma cleaner
Expertises

High Resolution Microscopy

High resolution microscopy with unequaled depth of focus. Imaging of insulating substrate without any conducive layer deposition thanks to the electron neutralizer

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Contacts : Dominique Mailly

High resolution lithography

The very small spot size and the quasi absence of proximity effect allow to obtain high very small features and high density

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Contacts : Dominique Mailly

High resolution direct milling

High resolution milling with a low yield with He ions. Yield can be improved using Neon ions to the detriment of weaker resolution. Unlike using Gallium ion milling there is no contamination of residual ions

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Contacts : Dominique Mailly

High resolution growth

The Oxford OMNIGIS system offers three gas precursors to deposit tungsten, platinum and SiO. Due to the exeptional depth of focus of the ion column and the fine spot together with a small interaction volume of the ions it possible to grow high aspect ratio nanowires

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Contacts : Dominique Mailly

Nano-manipulation

With the help of the two IMINA robots moving inside on the stage specimen holder, it is possible to either measure in situ the electrical characteristics of a nanostructure or manipulate them

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Contacts : Dominique Mailly, Laurent Couraud

Applications

High-Tc superconducting nano-junctions

Noise properties at RF frequencies of recently introduced high-Tc Josephson nano-junctions fabricated by mean of a Helium ion beam focused at sub-nanometer scale on a YBa2Cu3O7 thin film. Scientific Reports volume 10, 10256 (2020)

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Contacts : Christian Ulysse, @LPEM