Plasma Enhanced Chemical Vapor Deposition HF/LF Generators - Dielectric thin films / STS
Contacts : MAILLARD François
/ DURNEZ Alan
Deposition of SiOx, SiNx, SiONx and Si-H.
The two generators 13.56MHz (HighFrequency) and 380kHz (LowFrequency) are allowing stress control of silicon nitride films from -1.6GPa to +600MPa.
Applications: single Anti-reflective coating, isolation, etch mask (dry or wet)....