ICP-RIE SENTECH SI 500

Inductive Coupled Plasma - Reactive Ion Etching chlorine, bromine plasma

ICP-RIE SENTECH SI 500S

Inductive Coupled Plasma - Reactive Ion Etching chlorine, bromine plasma

ICP-RIE STS Multiplex ICP

Inductive Coupled Plasma - Reactive Ion Etching chlorine plasma

ICP-DRIE SPTS Rapier

Inductive Coupled Plasma - Reactive Ion Etching chlorine, bromine plasma

ICP-RIE Sentech SI 500

Inductive Coupled Plasma - Reactive Ion Etching fluorine plasma

CCP-RIE NEXTRAL 63

Capacitively Coupled Plasma - Reactive Ion Etching fluorine and oxygen plasma

CCP-RIE NEXTRAL 73

Capacitively Coupled Plasma - Reactive Ion Etching fluorine and oxygen plasma

CCP-RIE ADVANCE VACCUM

Capacitively Coupled Plasma - Reactive Ion Etching fluorine plasma

IBE Roth & Rau Ionsys 500 1

Ion beam etching system / Secondary ion mass spectrometry

IBE Roth & Rau Ionsys 500 2

Ion beam etching system / Secondary ion mass spectrometry

Vapor etch Xactix XeF2

Selective XeF2 vapor etch

Stripper NANOPLAS DSB300

High Density Radical Flux plasma cleaner downstream

Stripper DIENER Nano

Low-pressure plasma cleaner @13.56MHz

Stripper DIENER Pico

Low-pressure plasma cleaner @40kHz

CCP-RIE NEXTRAL 56

Capacitively Coupled Plasma - Reactive Ion Etching chlorine or CH4-O2 etching